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200L Standard RF vacuum plasma

Item NO:TS-PL200MA

Product introduction: Standard RF vacuum plasma cleaning machine

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Product Introduction


This standard off-line vacuum plasma cleaning machine, the function includes surface activation modification, increase adhesion, improve adhesion, handle all kinds of electronic materials, including plastic, metal or glass, etc.,used in all walks of life.


Specification


Item NO. TS-PL200MA
Power Frequency 40KHz/13.56MHz(Optional)
Volume 200L
Power 0-1000W(Adjustable)
Cavity size(mm) ((L*W*H))500*580*700mm
Layer 21
Overall size (L*W*H)1250*1230*1790mm
Vacuum pump Oil pum/dry pump + Roots combination (Optional)
Vacuum degree 5-100pa(Adjustable)
Material of Cavity 316 stainless steel/imported aluminum alloy(Optional)
Gas flow control 0-500SCCM(MFC±2%)
Gas channel Two way(addability):Ar/N2/H2/CF4/02
Plasma generator 40KHz/13.56MHz(Optional)
Tempture of capacity <30℃
Control mode PLC+Touch screen
Software of system control      Independent
Electrode ceramic Imported high frequency ceramics


Function


Etching: Useful for the removal of photoresist polyimide residues and silicid-based coatings;

Adhesion enhancement: The addition of highly active chemical groups to the substrate to improve the adhesive's adhesion;

Cleaning: Removal of optical material contamination and removal of organic residues, oxidation and metal salts on the material contamination;

Activation: It can cause the surface of the substrate to form the required chemical polar bonds;

Deplating: To remove metal and other materials from the treated substrate to produce various products.


Product Application








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